Lamp furnaces for testing machines

Lamp furnace for Rapid thermal Processing (RTP)

of semiconductor wafers. Heating rates up to 100 K/sec achievable. Clean thermal processing in quartz glass containment.

Lamp furnaces for Rapid Thermal Processing (RTP)

Lamp oven for foaming of aluminium plates

The plates can be over 4 m² in size and are foamed in a few minutes. The oven is part of an automatic cycle line. The installed heating capacity is 1.200 kW.

Lamp furnaces for fast heating up and cooling down

Extremely small heating system

The lamp heating system can be used in testing machines. Temperatures up to 1.300°C are possible for well absorbing samples. The heating system is extremely small and easy to install and remove in an existing system.

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